Silicon derivate layers/films produced by silicatein-mediated templating and process for making the same

SCHEDA BREVETTO

Abstract:

The present invention concerns a process for preparing products having layers/films of silicon derivates comprising the following steps: a) Preparing a mould made of elastomeric material and having a plurality of grooves with mutual spacing in the range from 1 .mu.m to 1mm;b) incubating the mould of step a) in a solution of silicateins in a range of temperatures from 2 to 10deg.C and in a range of time from few minutes to 10 3 hours; c) providing a target substrate of silicon or oxides thereof d) transferring the silicateins from the mould to the said target substrate through soft lithography technique for a time period from few seconds to 10 3 hours and removing the elastomeric mould; e) incubating the substrate with patterned silicateins of step d) in a solution of one or more precursors belonging to the class of silane compounds for a time period in a range from few seconds to 10 3 hours in a temperature range from 2deg.C to 25deg.C. The inventions concerns also a product obtainable by the disclosed process having remarkable electrical features.

Advantages:

At the end of the incubation step advantageously a drying substep of the mould is carried out in order to remove the excess solution.
[0037] The target substrate can advantageously be subjected to a cleaning substep of the surface to remove the native oxide and organic contaminants in order to obtain superficial reactive groups for next immobilization of silicateins.
However, also genetically modified and engineered silicateins show inhibition and loss of functionality when placed into contact with solid surfaces.

Application field:

FERMENTATION OR ENZYME-USING PROCESSES TO SYNTHESISE A DESIRED CHEMICAL COMPOUND OR COMPOSITION OR TO SEPARATE OPTICAL ISOMERS FROM A RACEMIC MIXTURE

Technical board:

he present invention concerns a process for preparing products having layers/films of silicon derivates comprising the following steps: a) Preparing a mould made of elastomeric material and having a plurality of grooves with mutual spacing in the range from 1 .mu.m to 1mm;b) incubating the mould of step a) in a solution of silicateins in a range of temperatures from 2 to 10deg.C and in a range of time from few minutes to 10 3 hours; c) providing a target substrate of silicon or oxides thereof d) transferring the silicateins from the mould to the said target substrate through soft lithography technique for a time period from few seconds to 10 3 hours and removing the elastomeric mould; e) incubating the substrate with patterned silicateins of step d) in a solution of one or more precursors belonging to the class of silane compounds for a time period in a range from few seconds to 10 3 hours in a temperature range from 2deg.C to 25deg.C. The inventions concerns also a product obtainable by the disclosed process having remarkable electrical features.

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Patent Title

Silicon derivate layers/films produced by silicatein-mediated templating and process for making the same

Other Title

Inventor(s)

PISIGNANO DARIO

BIASCO ADRIANA

LUCIA ANGELA

CAMPOSEO ANDREA

PAGLIARA STEFANO

POLINI ALESSANDRO

MUELLER WERNER

Published As

Publ. number Pub. date Appl. number
Appl. date
Publ. Stage
EP2246435 20101103
2009EP-0159065
20090429
A1 – Application published with search report

NsRIF

 10066– Catalogo brevetti CNR

Country of validity

EP

Ownership

CNR (10%) – NNL

NanotecMarin (90%)

Contacts

info@ilo-puglia.cnr.it